Yoonhee Kang

Title: Yoonhee Kang: Innovator in Ultra-Low-k Dielectric Layer Technology

Introduction

Yoonhee Kang is a prominent inventor based in Changwon-si, South Korea. She has made significant contributions to the field of semiconductor technology, particularly in the development of ultra-low-k dielectric layers. Her innovative work has led to advancements that are crucial for the miniaturization of electronic components.

Latest Patents

Yoonhee Kang holds a patent for "Methods of forming an ultra-low-k dielectric layer and dielectric layers formed thereby." This patent outlines methods for creating an ultra-low-k dielectric layer, which is essential for improving the performance of electronic devices. The process involves forming a first layer using a precursor that includes silicon, oxygen, carbon, and hydrogen. Following this, a first ultraviolet process is applied to convert the first layer into a second layer, and a second ultraviolet process is performed under different conditions to finalize the dielectric layer.

Career Highlights

Yoonhee Kang is currently employed at Samsung Electronics Co., Ltd., a leading global technology company. Her role involves research and development in semiconductor materials, where she applies her expertise to enhance product performance and efficiency. Her innovative approaches have positioned her as a key player in her field.

Collaborations

Yoonhee has collaborated with talented colleagues, including Jiyoung Kim and Taejin Yim. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Yoonhee Kang's contributions to the field of semiconductor technology, particularly through her patent on ultra-low-k dielectric layers, highlight her role as an influential inventor. Her work at Samsung Electronics Co., Ltd. continues to drive innovation in the industry.