Yoong Hooi Yong

Title: Yoong Hooi Yong: Innovator in Semiconductor Technology

Introduction

Yoong Hooi Yong is a notable inventor based in Ballston Lake, NY (US). He has made significant contributions to the field of semiconductor technology, particularly in the development of structures that enhance the performance of electronic devices. His innovative work has led to the granting of a patent that showcases his expertise and creativity.

Latest Patents

Yoong Hooi Yong holds a patent for an invention titled "Epitaxial region for embedded source/drain region having uniform thickness." This patent describes a semiconductor structure that includes a source/drain region. The source/drain region features a first epitaxial region along at least one sidewall, which has a substantially uniform sidewall thickness. The invention also details a method for forming this source/drain region, which includes creating a trench in a substrate adjacent to a gate structure and forming the first epitaxial region within that trench.

Career Highlights

Yoong Hooi Yong is currently employed at GlobalFoundries Inc., a leading semiconductor manufacturer. His work at the company has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in semiconductor technology. His patent reflects his commitment to improving the efficiency and effectiveness of semiconductor structures.

Collaborations

Throughout his career, Yoong Hooi Yong has collaborated with talented individuals such as Yanping Shen and Hsien-Ching Lo. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in the semiconductor industry.

Conclusion

In summary, Yoong Hooi Yong is a distinguished inventor whose work in semiconductor technology has resulted in valuable patents and advancements in the field. His contributions continue to influence the development of electronic devices, showcasing the importance of innovation in technology.