Daejeon, South Korea

Yoon Seong Kang

This inventor holds 1 USPTO granted patent. Top assignees: Samsung Sds Co., Ltd., Yonsei University. Active years: 2019.


% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Yoon Seong Kang: Innovator in Foreground Generation Technology

Introduction

Yoon Seong Kang is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of image processing, particularly in the development of methods for generating foregrounds in various applications.

Latest Patents

Yoon Seong Kang holds a patent titled "Method for generating foreground using multiple background models and apparatus thereof." This innovative method involves extracting multiple foregrounds by applying various background models to an image. The background models are designed with different ranges of pixel variance values. The process includes generating an intersection foreground based on the intersection region among the extracted foregrounds, as well as a union foreground based on the union region. Ultimately, a final foreground is produced by combining the intersection and union foregrounds.

Career Highlights

Throughout his career, Yoon Seong Kang has worked with prominent organizations such as Samsung SDS Co., Ltd. and Yonsei University. His experience in these institutions has allowed him to refine his skills and contribute to advancements in technology.

Collaborations

Yoon Seong Kang has collaborated with talented individuals in his field, including Sung Woo Kim and Hye Ran Byun. These partnerships have fostered innovation and have been instrumental in the development of his patented technology.

Conclusion

Yoon Seong Kang is a distinguished inventor whose work in foreground generation technology has made a significant impact in the field of image processing. His innovative methods and collaborations continue to influence advancements in this area.

Profile summary based on public USPTO records.
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