Seongnam, South Korea

Yonk Uk Kwon

This inventor holds 1 USPTO granted patent. Top assignee: Soonhan Engineering, Inc.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yonk Uk Kwon. Retrieved from https://idiyas.com/inventor/yonk-uk-kwon

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Yonk Uk Kwon: Innovator in Linear Motion Technology

Introduction

Yonk Uk Kwon is a notable inventor based in Seongnam, South Korea. He has made significant contributions to the field of linear motion technology, particularly in the area of dynamic and thermal error compensation.

Latest Patents

Yonk Uk Kwon holds a patent for a "System for compensating dynamic and thermal deformity errors of linear motion single-plane gantry stage in real time." This innovative system includes a first two-dimensional position measuring unit for measuring the position of an X-axially movable gantry beam, a second two-dimensional position measuring unit for a Y-axially movable slider, a thermal fixing point for thermal reference, and a compensation control unit for real-time error motion control.

Career Highlights

Yonk Uk Kwon is currently employed at Soonhan Engineering, Inc., where he applies his expertise in developing advanced motion control systems. His work focuses on enhancing the precision and reliability of linear motion applications.

Collaborations

He has collaborated with colleagues such as Byoung Gwan Ko and Banik Rahul, contributing to various projects that aim to improve motion technology.

Conclusion

Yonk Uk Kwon's innovative work in linear motion technology exemplifies the importance of precision in engineering applications. His contributions continue to influence the field and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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