Seoul, South Korea

YongMin Yoo


Average Co-Inventor Count = 10.0

ph-index = 1

Forward Citations = 363(Granted Patents)


Company Filing History:


Years Active: 2020-2023

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3 patents (USPTO):

Title: Innovations of YongMin Yoo in Silicon Nitride Film Technology

Introduction

YongMin Yoo is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the development of methods for forming silicon nitride films. With a total of three patents to his name, his work has implications for the fabrication of advanced electronic devices.

Latest Patents

YongMin Yoo's latest patents include innovative methods for forming silicon nitride films selectively on various surfaces. One of his patents describes a method for fabricating a layer structure in a trench. This method involves simultaneously forming a dielectric film containing a Si–N bond on the upper surface, bottom surface, and sidewalls of the trench. The top/bottom portion of the film is given different chemical resistance properties compared to the sidewall portion through plasma bombardment. This allows for the selective removal of the sidewall portion by wet etching, which is more effective due to the differing chemical resistance properties. Another patent outlines a similar method focused on selectively forming silicon nitride films on the top surface, emphasizing the same principles of chemical resistance and selective etching.

Career Highlights

YongMin Yoo is currently employed at ASM IP Holding B.V., where he continues to innovate in the field of semiconductor manufacturing. His expertise in silicon nitride film technology has positioned him as a key player in advancing fabrication techniques that enhance the performance and reliability of electronic components.

Collaborations

YongMin Yoo has collaborated with esteemed colleagues such as Dai Ishikawa and Atsuki Fukazawa. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

YongMin Yoo's contributions to the field of semiconductor technology through his patents on silicon nitride film formation are noteworthy. His work not only advances the technology but also sets a foundation for future innovations in electronic device fabrication.

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