Siheung, South Korea

Yonghwan Kim

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Sl Mirrortech Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yonghwan Kim. Retrieved from https://idiyas.com/inventor/yonghwan-kim-6qw5qyyo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Yonghwan Kim: Innovator in Camera Technology

Introduction

Yonghwan Kim is a notable inventor based in Siheung, South Korea. He has made significant contributions to the field of camera technology, particularly with his innovative designs aimed at enhancing camera functionality.

Latest Patents

Yonghwan Kim holds a patent for a "Wiping apparatus for camera and control method therefor." This invention features a housing that accommodates a driving part, a rotation part that engages with a worm gear, and a conversion part that transforms rotational motion into linear reciprocating motion. The cleaning part extends from the conversion part to the exterior of the housing, effectively wiping the surface of a protective cover in front of a camera lens.

Career Highlights

Yonghwan Kim is currently employed at Sl Mirrortech Corporation, where he continues to develop innovative solutions in camera technology. His work has been instrumental in advancing the functionality and usability of camera systems.

Collaborations

Yonghwan collaborates with talented coworkers, including Yonghei Kim and Mingi Jung, contributing to a dynamic team environment that fosters innovation.

Conclusion

Yonghwan Kim's contributions to camera technology through his patented inventions highlight his role as a key innovator in the field. His work continues to influence the development of advanced camera systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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