Gyeonggi-do, South Korea

YongHwa Park

This inventor holds 1 USPTO granted patent and 9 EPO patents. Top assignee: Lg Display Co., Ltd.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: YongHwa Park. Retrieved from https://idiyas.com/inventor/yonghwa-park-pp5nqq5k

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: YongHwa Park: Innovator in Display Technology

Introduction

YongHwa Park is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of display technology, particularly through his innovative patent that addresses power consumption in display devices.

Latest Patents

YongHwa Park holds 1 patent for a display device, display controller, data driving circuit, and low-power driving method. This invention is designed to prevent undesirable current in the data driving circuit and reduce power consumption. It achieves this by utilizing different types of clock signals needed for data storing processing, depending on whether there is a data transition or not.

Career Highlights

Throughout his career, YongHwa Park has worked with prominent companies in the technology sector, including LG Display Co., Ltd. and Samsung Electronics Co., Ltd. His experience in these leading firms has allowed him to refine his skills and contribute to advancements in display technology.

Collaborations

YongHwa Park has collaborated with talented individuals such as Daeho Park and Daeseok Oh. These partnerships have likely enriched his work and fostered innovation in his projects.

Conclusion

YongHwa Park is a distinguished inventor whose work in display technology has made a significant impact. His innovative approach to reducing power consumption in display devices showcases his expertise and commitment to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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