Company Filing History:
Years Active: 2004-2005
Title: Yongbae Kim: Innovator in Dual Damascene Structures
Introduction
Yongbae Kim is a notable inventor based in Cupertino, CA. He has made significant contributions to the field of semiconductor technology, particularly in the area of dual damascene structures. With a total of 3 patents to his name, Kim's work has had a substantial impact on the industry.
Latest Patents
One of Yongbae Kim's latest patents is a method of preventing resist poisoning in dual damascene structures. This innovative method involves forming a dual damascene interconnect in a dielectric layer. The process begins with etching a first aperture in the dielectric. A poison barrier layer is then formed over part of the dielectric, which effectively prevents resist poisoning. Following this, a patterned mask is created over the poison barrier layer, and a second aperture is etched into the dielectric layer. Notably, at least part of the first aperture shares the same area as at least part of the second aperture.
Career Highlights
Yongbae Kim is currently employed at LSI Logic Corporation, where he continues to advance his research and development efforts. His work at the company has allowed him to collaborate with other talented professionals in the field.
Collaborations
Some of his notable coworkers include Sang-Yun Lee and Hiroaki Takikawa. Their collective expertise contributes to the innovative environment at LSI Logic Corporation.
Conclusion
Yongbae Kim's contributions to the field of semiconductor technology, particularly through his patents on dual damascene structures, highlight his role as a key innovator. His work continues to influence advancements in the industry.