Philadelphia, PA, United States of America

Yong Yang

This inventor holds 1 USPTO granted patent. Top assignee: Drexel University. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yong Yang. Retrieved from https://idiyas.com/inventor/yong-yang-wfjq51o4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2014

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Yong Yang - Innovator in Plasma Discharge Filtration Technology

Introduction

Yong Yang is a notable inventor based in Philadelphia, PA, recognized for his innovative contributions to filtration technology. He has developed a unique method for cleaning filter surfaces, which has significant implications for various industrial applications.

Latest Patents

Yong Yang holds a patent for a Plasma Discharge Self-Cleaning Filtration System. This invention introduces a novel method that utilizes plasma discharges to generate short electric pulses at high voltages. These electrical pulses create strong shockwaves that effectively disintegrate and dislodge particulate matter from the filter surface, enhancing the efficiency of filtration systems.

Career Highlights

Yong Yang is affiliated with Drexel University, where he continues to advance his research and development efforts. His work in the field of filtration technology has positioned him as a key figure in the academic and industrial communities.

Collaborations

Yong Yang has collaborated with esteemed colleagues, including Young I Cho and Alexander Fridman, to further explore the applications of his innovative filtration methods.

Conclusion

Yong Yang's contributions to plasma discharge filtration technology exemplify the potential of innovative solutions in improving industrial processes. His work not only enhances filtration efficiency but also paves the way for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…