Goyang-si, South Korea

Yong Cheol Hong

USPTO Granted Patents = 8 

 

Average Co-Inventor Count = 3.5

ph-index = 3

Forward Citations = 31(Granted Patents)


Location History:

  • Inchon, KR (2003 - 2004)
  • Daejeon-si, KR (2015)
  • Daejeon, KR (2017)
  • Goyang-Si, KR (2018 - 2020)

Company Filing History:


Years Active: 2003-2025

Loading Chart...
Loading Chart...
8 patents (USPTO):Explore Patents

Title: Yong Cheol Hong: Innovator in Plasma Technology

Introduction

Yong Cheol Hong is a prominent inventor based in Goyang-si, South Korea. He has made significant contributions to the field of plasma technology, holding a total of 8 patents. His innovative work focuses on developing devices that utilize plasma for various applications, particularly in water treatment and generation.

Latest Patents

One of his latest inventions is a plasma generation device. This device comprises an electromagnetic wave generator, a plasma torch that generates plasma through arc discharge, and a waveguide that transmits electromagnetic waves to the plasma side. The electromagnetic wave heats one side portion of the plasma, enhancing its efficiency. Another notable patent is a plasma water treatment apparatus designed to remove color while restraining total nitrogen. This apparatus includes a plasma generator that generates plasma in water and a porous dielectric that adsorbs nitrogen oxide, effectively improving wastewater quality.

Career Highlights

Yong Cheol Hong has worked with the Korea Basic Science Institute, where he has contributed to various research projects and innovations. His expertise in plasma technology has positioned him as a key figure in advancing this field.

Collaborations

He has collaborated with notable coworkers, including Se Min Chun and Han S Uhm, who have supported his research endeavors.

Conclusion

Yong Cheol Hong's contributions to plasma technology and water treatment demonstrate his innovative spirit and commitment to improving environmental solutions. His patents reflect a deep understanding of the complexities of plasma applications, making him a valuable inventor in this domain.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…