Hwaseong, South Korea

Yong Bae Lee

This inventor holds 1 USPTO granted patent. Top assignee: Suprema Inc.. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yong Bae Lee. Retrieved from https://idiyas.com/inventor/yong-bae-lee-rt7fr2bf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Yong Bae Lee: Innovator in Fingerprint Technology

Introduction

Yong Bae Lee is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of fingerprint identification technology. His innovative approach addresses the critical issue of identifying fake fingerprints, which is essential for security applications.

Latest Patents

Yong Bae Lee holds a patent for a "Method and apparatus for identifying fake fingerprint." This apparatus includes a prism with a fingerprint contact surface, an internal light source, an external light source, an image sensor, and a controller. The device is designed to compare images acquired from both light sources to determine the authenticity of a fingerprint. He has 1 patent to his name.

Career Highlights

Yong Bae Lee is currently employed at Suprema Inc., a company known for its advanced biometric solutions. His work at Suprema has positioned him as a key player in the development of innovative security technologies.

Collaborations

He collaborates with talented coworkers, including Ho Chul Shin and Jin Wook Yi, who contribute to the advancement of their projects and innovations.

Conclusion

Yong Bae Lee's contributions to fingerprint technology exemplify the importance of innovation in enhancing security measures. His work continues to influence the field and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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