Yoneji Sato

Title: Yoneji Sato: Innovator in Photo-Imaging Resist Technology

Introduction

Yoneji Sato is a notable inventor based in Hachioji, Japan. He has made significant contributions to the field of photo-imaging resist technology, holding a total of 2 patents. His work has been instrumental in advancing materials used in various applications.

Latest Patents

One of Yoneji Sato's latest patents is for a photo-imaging resist ink and its cured product. This innovative ink contains an unsaturated group-containing polycarboxylic acid resin, which is a reaction product of succinic anhydride and an additive reaction product of an epoxy resin with an unsaturated group-containing monocarboxylic acid. The resist ink demonstrates excellent developability and photosensitivity. Additionally, the cured product exhibits outstanding flex resistance, folding resistance, and satisfactory adhesion, pencil hardness, solvent resistance, acid resistance, and heat resistance. Another significant patent involves a resin composition for solder resist ink, which comprises essential ingredients tailored for effective solder resist applications.

Career Highlights

Throughout his career, Yoneji Sato has worked with prominent companies, including Dainippon Ink and Chemicals, Incorporated and Asahi Chemical Research Laboratory, Ltd. His experience in these organizations has allowed him to refine his expertise in materials science and innovation.

Collaborations

Yoneji Sato has collaborated with notable colleagues such as Masato Hoshino and Seiichi Kitazawa. These partnerships have contributed to the development of advanced technologies in the field.

Conclusion

Yoneji Sato's contributions to photo-imaging resist technology and his innovative patents highlight his role as a significant figure in the field. His work continues to influence advancements in materials science and engineering.