Fuji, Japan

Yoneharu Tanaka

This inventor holds 1 USPTO granted patent. Top assignee: Asahi Kasei Kogyo Kabushiki Kaisha. Active years: 1980.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoneharu Tanaka. Retrieved from https://idiyas.com/inventor/yoneharu-tanaka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 1980

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Yoneharu Tanaka: Innovator in Polymer Technology

Introduction

Yoneharu Tanaka is a notable inventor based in Fuji, Japan. He has made significant contributions to the field of polymer technology, particularly in the area of resin compositions. His innovative approach has led to advancements that benefit various applications in the industry.

Latest Patents

Tanaka holds a patent for a method of removing surface tack of cured free radical polymerized resin. This novel method involves impregnating the surface layer of the cured resin with a specific organic carbonyl compound and subsequently irradiating it with specific actinic rays. This technique is particularly effective for removing surface tack from cured photopolymerized or heat-polymerized resin compositions, especially those used in photopolymer type printing plates.

Career Highlights

Yoneharu Tanaka is associated with Asahi Kasei Kogyo Kabushiki Kaisha, a leading company in the chemical industry. His work has been instrumental in enhancing the performance and usability of resin materials, making significant strides in polymer science.

Collaborations

Tanaka has collaborated with esteemed colleagues such as Gensho Takahashi and Kazuhito Miyoshi. Their combined expertise has contributed to the development of innovative solutions in the field of polymer technology.

Conclusion

Yoneharu Tanaka's contributions to polymer technology through his patented methods demonstrate his commitment to innovation. His work continues to influence the industry positively, showcasing the importance of research and development in advancing material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…