Yonchan Ban

Title: Innovations of Yonchan Ban in Semiconductor Technology

Introduction

Yonchan Ban is a notable inventor based in Austin, TX, who has made significant contributions to the field of semiconductor technology. He is recognized for his innovative approach to mask layouts in the manufacturing process of integrated circuits. His work has implications for improving the efficiency and accuracy of semiconductor fabrication.

Latest Patents

Yonchan Ban holds a patent titled "Method and apparatus for determining mask layouts for a spacer-is-dielectric self-aligned double-patterning process." This patent describes methods and apparatuses for determining mask layouts that effectively print design intents on a wafer using a specialized double-patterning process. The system he developed can assess whether a graph corresponding to a design intent is two-colorable. If the graph is not two-colorable, the system can merge pairs of shapes in the design intent to create a modified design intent, ensuring that the modified graph is two-colorable. This innovative approach allows for efficient placement of core shapes in a mandrel mask layout and shapes in a trim mask layout, enhancing the overall design process.

Career Highlights

Yonchan Ban is currently employed at Synopsys, Inc., a leading company in electronic design automation. His work at Synopsys focuses on advancing technologies that support the semiconductor industry. He has demonstrated a strong commitment to innovation and excellence in his field.

Collaborations

Yonchan collaborates with various professionals in the industry, including his coworker Kevin D. Lucas. Their combined expertise contributes to the development of cutting-edge solutions in semiconductor manufacturing.

Conclusion

Yonchan Ban's contributions to semiconductor technology through his innovative patent and work at Synopsys, Inc. highlight his role as a key figure in advancing the industry. His efforts continue to shape the future of semiconductor fabrication processes.