Fuji, Japan

Yoko Ueno

This inventor holds 1 USPTO granted patent. Top assignee: Asahi Kasei Kogyo Kabushiki Kaisha. Active years: 1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoko Ueno. Retrieved from https://idiyas.com/inventor/yoko-ueno-fzvpc63h

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: Yoko Ueno: Innovator in Photosensitive Resin Technology

Introduction

Yoko Ueno is a prominent inventor based in Fuji, Japan. She has made significant contributions to the field of materials science, particularly in the development of photosensitive resin compositions. Her innovative work has led to advancements in printing technologies, specifically for corrugated boards.

Latest Patents

Yoko Ueno holds 1 patent for her invention of a photosensitive resin composition used for corrugated board printing. This patent showcases her expertise in creating materials that enhance the quality and efficiency of printing processes.

Career Highlights

Ueno is currently employed at Asahi Kasei Kogyo Kabushiki Kaisha, a leading company in the chemical industry. Her role at the company allows her to apply her knowledge and skills in developing innovative materials that meet industry demands.

Collaborations

Throughout her career, Yoko Ueno has collaborated with notable colleagues, including Norihiko Sakata and Shusaku Tabata. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Yoko Ueno's contributions to the field of photosensitive resin technology exemplify her dedication to innovation. Her work continues to impact the printing industry positively, showcasing the importance of creativity and collaboration in scientific advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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