Ikeda, Japan

Yoicho Otsuka

This inventor holds 1 USPTO granted patent. Top assignee: Osaka University. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoicho Otsuka. Retrieved from https://idiyas.com/inventor/yoicho-otsuka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Yoicho Otsuka

Introduction

Yoicho Otsuka is a notable inventor based in Ikeda, Japan. He has made significant contributions to the field of nanotechnology through his innovative patent. His work focuses on measuring and evaluating local electrical characteristics of samples with nano-scale structures.

Latest Patents

Otsuka holds a patent for a "Method and apparatus for measuring and evaluating local electrical characteristics of a sample having a nano-scale structure." This invention features a probe device that includes a cantilever. The probe is designed to be opposed to the surface of a sample, allowing for precise measurements. The apparatus can switch between two operating modes: a tapping mode for measuring surface structure while vibrating the cantilever, and a point contact mode for assessing the electrical characteristics by bringing the probe into contact with the sample.

Career Highlights

Otsuka is affiliated with Osaka University, where he continues to advance research in his field. His work has garnered attention for its potential applications in various technological advancements.

Collaborations

He has collaborated with notable colleagues, including Takuya Matsumoto and Yasuhisa Naitoh, contributing to the development of innovative solutions in nanotechnology.

Conclusion

Yoicho Otsuka's contributions to the field of nanotechnology through his patent demonstrate his commitment to advancing scientific knowledge and innovation. His work continues to inspire future research and development in this critical area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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