Saitama, Japan

Yoichiro Fujita


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Yoichiro Fujita: Innovator in Semiconductor Materials

Introduction

Yoichiro Fujita is a prominent inventor based in Saitama, Japan. He has made significant contributions to the field of semiconductor materials, particularly in the development of chemical compositions for the efficient removal of photoresist and other materials used in integrated circuitry manufacturing.

Latest Patents

Fujita holds a patent for a unique invention titled "Resist, barc and gap fill material stripping chemical and method." This aqueous-based composition is designed to effectively remove photoresist, bottom anti-reflective coating (BARC) material, and gap fill material from substrates. The composition includes a fluoride source, at least one organic amine, at least one organic solvent, water, and optionally a chelating agent and/or surfactant. This innovative solution achieves high-efficiency removal of materials without adversely affecting metal species, such as copper, on the substrate, and it does not damage SiOC-based dielectric materials used in semiconductor architecture. Fujita's work in this area has resulted in 1 patent.

Career Highlights

Fujita is associated with Advanced Technology Materials, Inc., where he continues to push the boundaries of semiconductor technology. His expertise in chemical compositions has positioned him as a key player in the industry, contributing to advancements that enhance manufacturing processes.

Collaborations

Throughout his career, Fujita has collaborated with notable colleagues, including David Daniel Bernhard and Tomoe Miyazawa. These partnerships have fostered innovation and have been instrumental in the development of new technologies in the semiconductor field.

Conclusion

Yoichiro Fujita's contributions to semiconductor materials and his innovative patent demonstrate his commitment to advancing technology in this critical industry. His work continues to influence the manufacturing processes of integrated circuitry, showcasing the importance of innovation in the field.

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