The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2011
Filed:
Dec. 01, 2004
David D. Bernhard, Kooskia, ID (US);
Yoichiro Fujita, Saitama, JP;
Tomoe Miyazawa, Higashikurume, JP;
Makoto Nakajima, Toyama, JP;
David D. Bernhard, Kooskia, ID (US);
Yoichiro Fujita, Saitama, JP;
Tomoe Miyazawa, Higashikurume, JP;
Makoto Nakajima, Toyama, JP;
Advanced Technology Materials, Inc., Danbury, CT (US);
Abstract
An aqueous-based composition and process for removing photoresist, bottom anti-reflective coating (BARC) material, and/or gap fill material from a substrate having such material(s) thereon. The aqueous-based composition includes a fluoride source, at least one organic amine, at least one organic solvent, water, and optionally chelating agent and/or surfactant. The composition achieves high-efficiency removal of such material(s) in the manufacture of integrated circuitry without adverse effect on metal species on the substrate, such as copper, and without damage to SiOC-based dielectric materials employed in the semiconductor architecture.