Yoichi Tanifuji is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of particulate silica and organohalosilanes. With a total of 14 patents to his name, Tanifuji's work has had a substantial impact on various industrial applications.

Latest Patents

Tanifuji's latest patents include innovative methods for the preparation of particulate silica and organohalosilanes. The first patent describes a process for preparing particulate silica by feeding a gas mixture of organohalosilane gas, a flammable gas, and a free oxygen-containing gas into a reaction chamber. This method utilizes flame hydrolysis and oxidation reactions to produce silica with a surface area of 100-400 m/g and a narrow particle size distribution. The second patent focuses on an industrial process for preparing organohalosilanes, which enhances the silane formation rate and silicon utilization without compromising selectivity.

Career Highlights

Tanifuji is currently associated with Shin-Etsu Chemical Co., Ltd., where he continues to innovate and develop new materials. His work has been instrumental in advancing the understanding and application of silicon-based compounds in various industries.

Collaborations

Throughout his career, Tanifuji has collaborated with notable colleagues such as Susumu Ueno and Mikio Aramata. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Yoichi Tanifuji's contributions to the field of materials science, particularly in the development of silica and organohalosilanes, highlight his role as a leading inventor. His ongoing work at Shin-Etsu Chemical Co., Ltd. continues to push the boundaries of innovation in this vital area of research.

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