The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2000
Filed:
Oct. 05, 1999
Applicant:
Inventors:
Mikio Aramata, Annaka, JP;
Yoichi Tanifuji, Annaka, JP;
Hisashi Konishi, Annaka, JP;
Susumu Ueno, Annaka, JP;
Tetsuya Inukai, Annaka, JP;
Toshio Shinohara, Annaka, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427217 ; 427 11 ; 427212 ; 427215 ; 427216 ; 427242 ;
Abstract
A contact mass for use in the synthesis of organohalosilanes is prepared by adding metallic copper particles to metallic silicon particles, and rubbing the particles against each other under high shear forces in a non-oxidizing atmosphere, thereby forming a metallic copper thin film on the surface of the metallic silicon particles in a spot pattern or entirely. The contact mass is capable of reducing the time required for activation and has an extended lifetime.