This inventor holds 1 USPTO granted patent. Top assignees: Tanaka Kikinzoku Kogyo K.k., Yeungnam University. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 372 
1 out of 57 Years Active: 2024
Title: Yohei Kotsugi: Innovator in Ruthenium Thin Film Technology
Introduction
Yohei Kotsugi is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of materials science, particularly in the development of methods for forming thin films. His innovative approach has led to advancements in various applications, including electronics and coatings.
Latest Patents
Kotsugi holds a patent for a method for forming a ruthenium thin film. This invention utilizes a ruthenium precursor known as tricarbonyl (η-methylene-1,3-propanediyl) ruthenium ((CO)Ru-TMM). The method involves atomic layer deposition at temperatures ranging from 200° C. to 350° C., using this precursor along with a reaction gas. The reaction gas can include one or more components selected from oxygen, hydrogen, water, and ammonia.
Career Highlights
Throughout his career, Kotsugi has worked with esteemed organizations, including the Research Cooperation Foundation of Yeungnam University and Tanaka Kikinzoku Kogyo Co., Ltd. His work has been instrumental in advancing the understanding and application of ruthenium thin films in various industries.
Collaborations
Kotsugi has collaborated with Soo-Hyun Kim, contributing to the development of innovative technologies in his field.
Conclusion
Yohei Kotsugi's contributions to the field of thin film technology, particularly through his patented methods, highlight his role as a significant inventor. His work continues to influence advancements in materials science and related applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile