Ichihara, Japan

Yohei Fujii

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Sumitomo Chemical Company, Limited. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yohei Fujii. Retrieved from https://idiyas.com/inventor/yohei-fujii-95zfc87a

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile



Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: The Innovations of Yohei Fujii

Introduction

Yohei Fujii is a notable inventor based in Ichihara, Japan. He has made significant contributions to the field of materials science, particularly in the development of modified carbon black. His work has implications for various industries, including rubber and plastics.

Latest Patents

Fujii holds a patent for a modified carbon black that comprises carbon black and at least one compound selected from a specific group. The content of this compound relative to 100 parts by weight of carbon black ranges from 0.1 to 50 parts by weight. This innovation enhances the properties of carbon black, making it more versatile for industrial applications.

Career Highlights

Yohei Fujii is associated with Sumitomo Chemical Company, Limited, where he has been instrumental in advancing research and development in materials. His expertise in carbon black has positioned him as a key figure in the company’s innovation efforts.

Collaborations

Fujii has worked alongside Hiroshi Shiratani, contributing to various projects that focus on enhancing material properties and applications. Their collaboration has led to advancements that benefit both the company and the broader industry.

Conclusion

Yohei Fujii's contributions to the field of materials science, particularly through his patent on modified carbon black, highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry and pave the way for future developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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