Suwon, South Korea

Yohan Choe

This inventor holds 3 USPTO granted patents. Top assignees: Samsung Electronics Ltd., Samsung Electronics Co., Ltd., Seoul National University. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yohan Choe. Retrieved from https://idiyas.com/inventor/yohan-choe

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 66.7

Average Co-Inventor Count = 5.5

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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3 patents (USPTO):Explore Patents

Title: Yohan Choe: Innovator in Semiconductor Technology

Introduction

Yohan Choe is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.

Latest Patents

Yohan Choe holds a patent for a "Substrate processing apparatus and method of manufacturing semiconductor device using the same." This invention features a substrate stage that supports a semiconductor substrate and is rotatable at a predetermined angular velocity. The apparatus includes a discharge device positioned above the substrate stage, designed to discharge a chemical solution onto the semiconductor substrate. The discharge device consists of a nozzle arm that moves radially from the central region to the peripheral region of the substrate stage. The nozzle, facing the substrate stage, discharges the chemical solution at a specific angle, which can be adjusted to gradually decrease as the nozzle arm moves outward.

Career Highlights

Throughout his career, Yohan Choe has worked with prominent organizations, including Samsung Electronics and Seoul National University. His experience in these institutions has allowed him to refine his skills and contribute to advancements in semiconductor technology.

Collaborations

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Conclusion

Yohan Choe's innovative work in semiconductor technology, particularly his patented substrate processing apparatus, showcases his expertise and commitment to advancing the field. His contributions are significant and reflect his dedication to innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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