Zama, Japan

Yoh Somemura

This inventor holds 1 USPTO granted patent. Top assignee: Nippon Telegraph and Telephone Corporation. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoh Somemura. Retrieved from https://idiyas.com/inventor/yoh-somemura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: Yoh Somemura: Innovator in X-ray Technology

Introduction

Yoh Somemura is a notable inventor based in Zama, Japan. He has made significant contributions to the field of X-ray technology, particularly through his innovative patent related to X-ray exposure masks. His work has implications for various applications in the semiconductor industry and beyond.

Latest Patents

Somemura holds a patent for an X-ray exposure mask and its fabrication method. This invention comprises an X-ray transmission layer and an X-ray absorption layer that is patterned on the transmission layer. The X-ray absorption layer features a first region with a specific thickness and a second region with a reduced thickness, enhancing the functionality of the mask in X-ray applications.

Career Highlights

Yoh Somemura is associated with Nippon Telegraph and Telephone Corporation, a leading telecommunications company in Japan. His role at the company has allowed him to work on cutting-edge technologies and contribute to advancements in the field of X-ray imaging.

Collaborations

Somemura has collaborated with notable colleagues, including Kimiyoshi Deguchi and Kazunori Miyoshi. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Yoh Somemura's contributions to X-ray technology through his patent demonstrate his innovative spirit and commitment to advancing the field. His work continues to influence the industry and showcases the importance of collaboration in technological development.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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