Yoel Feier

Title: Yoel Feier: Innovator in Electron Beam Overlay Technology

Introduction

Yoel Feier is a notable inventor based in Haifa, Israel. He has made significant contributions to the field of semiconductor metrology through his innovative patent. His work focuses on enhancing the precision of overlay measurements, which are crucial in the manufacturing of semiconductor devices.

Latest Patents

Yoel Feier holds a patent for an "Overlay mark design for electron beam overlay." This patent describes electron beam overlay targets and methods for performing overlay measurements using a semiconductor metrology tool. The invention includes a target that features a plurality of electron beam overlay elements and two-dimensional elements, which provide at least one two-dimensional imaging. The two-dimensional elements consist of an array of evenly spaced polygonal gratings arranged across at least three rows and three columns. Additionally, the target incorporates electron beam overlay elements that include at least two gratings overlaid at perpendicular orientations to each other.

Career Highlights

Throughout his career, Yoel Feier has demonstrated a commitment to advancing semiconductor technology. His innovative approach to overlay measurements has positioned him as a key figure in the field. With a patent count of 1 patent, he continues to contribute to the development of more accurate and efficient semiconductor manufacturing processes.

Collaborations

Yoel has collaborated with talented individuals such as Inna Steely-Tarshish and Stefan Eyring. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

In summary, Yoel Feier is an accomplished inventor whose work in electron beam overlay technology has made a significant impact on the semiconductor industry. His innovative patent reflects his dedication to improving measurement techniques, and his collaborations further enhance his contributions to the field.