Other

Yoel Feier

Mark Ghinovker

Nadav Gutman

Stefan Eyring

Raviv Yohanan

Eitan Hajaj

Ulrich Pohlmann

Inna Steely-Tarshish

Ira Naot

Chris Steely

Electron beam overlay targets and method of performing overlay measurements on a target using a semiconductor metrology tool are provided. One target includes a plurality of electron beam overlay elements and a plurality of two-dimensional elements that provide at least one two-dimensional imaging. The plurality of two dimensional elements are an array of evenly-spaced polygonal gratings across at least three rows and at least three columns. Another target includes a plurality of electron beam overlay elements and a plurality of AIMid elements. Each of the electron beam overlay elements includes at least two gratings that are overlaid at a perpendicular orientation to each other. The plurality of AIMid elements includes at least two gratings that are overlaid at a perpendicular orientation to each other.

Overlay mark design for electron beam overlay

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Haifa, Israel

Yoel Feier