Eilon, Israel

Yoash Carmi

USPTO Granted Patents = 3 

Average Co-Inventor Count = 1.6

ph-index = 2

Forward Citations = 11(Granted Patents)


Location History:

  • Kibbutz Eilon, IL (2008)
  • Eilon, IL (2009 - 2011)

Company Filing History:


Years Active: 2008-2011

Loading Chart...
3 patents (USPTO):Explore Patents

Title: Yoash Carmi: Innovator in Conductive Layer Manufacturing

Introduction

Yoash Carmi is a notable inventor based in Eilon, Israel. He has made significant contributions to the field of manufacturing conductive layers, holding a total of 3 patents. His innovative methods have advanced the technology used in various applications, particularly in the electronics industry.

Latest Patents

Carmi's latest patents include a method of manufacturing a patterned conductive layer. This method involves applying a coating layer of electrically conductive transparent compounds onto a substrate, followed by depositing an electrically conductive material in a vacuum deposition chamber. The process includes applying an etch-resist material on selective areas and chemically etching the conductive material from exposed areas. Another patent focuses on patterns of conductive objects on a substrate coated with inorganic compounds. This method also utilizes vacuum deposition and electroplating techniques to create intricate patterns of conductive elements.

Career Highlights

Yoash Carmi is currently associated with Hanita Coatings R.C.A. Ltd., where he continues to innovate in the field of conductive materials. His work has been instrumental in developing new manufacturing techniques that enhance the efficiency and effectiveness of conductive layer applications.

Collaborations

Carmi collaborates with talented individuals such as Dany Eisenstadt and Gal Wollach, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

Yoash Carmi's contributions to the field of conductive layer manufacturing exemplify his commitment to innovation. His patents reflect a deep understanding of materials and processes that are crucial for advancements in technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…