The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2009

Filed:

Apr. 02, 2007
Applicants:

Gal Wollach, Haifa, IL;

Yoash Carmi, Eilon, IL;

Dany Eisenstadt, Kefar Veradim, IL;

Inventors:

Gal Wollach, Haifa, IL;

Yoash Carmi, Eilon, IL;

Dany Eisenstadt, Kefar Veradim, IL;

Assignee:

Hanita Coatings R.C.A. Ltd, Kibbutz Hanita, IL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01R 43/00 (2006.01); H01Q 13/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

According to embodiments of the present invention, a method for manufacturing a pattern of conductive elements on a substrate is provided. The method includes depositing in a vacuum deposition chamber an electrically conductive material onto the substrate to form a base layer. Then, the method includes selectively applying an electric insulating agent on selective areas of the base layer. Then, areas of the base layer that are not covered with the insulating material are electroplated with a second electrically conductive layer. The electric insulating agent is then removed from the substrate and the base layer is chemically etched thus removing the base layer that was covered with the insulating material and selectively exposing the substrate to create the pattern of conductive objects on the substrate.


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