Company Filing History:
Years Active: 2009-2023
Title: Gal Wollach: Innovator in Conductive Patterns
Introduction
Gal Wollach is a notable inventor based in Haifa, Israel. He has made significant contributions to the field of conductive materials, holding 2 patents that showcase his innovative approach to manufacturing patterns of conductive objects.
Latest Patents
One of his latest patents is titled "Digital level - Patterns of conductive objects on a substrate coated with inorganic compounds and method of producing thereof." This invention provides a method for manufacturing a pattern of conductive elements on a substrate. The process involves depositing an electrically conductive material onto the substrate to form a base layer, selectively applying an electric insulating agent, and electroplating areas of the base layer that are not covered. The method concludes with the removal of the insulating agent and chemical etching to create the desired pattern.
Career Highlights
Throughout his career, Gal Wollach has worked with several companies, including Hanita Coatings R.C.A. Ltd and Kapro Industries Limited. His experience in these organizations has contributed to his expertise in the field of conductive materials and innovative manufacturing techniques.
Collaborations
Gal has collaborated with notable individuals in his field, including Yoash Carmi and Dany Eisenstadt. These partnerships have likely enhanced his work and contributed to the development of his patents.
Conclusion
Gal Wollach is a distinguished inventor whose work in conductive patterns has made a significant impact in his field. His innovative methods and collaborations reflect his commitment to advancing technology in conductive materials.