Company Filing History:
Years Active: 2002-2008
Title: Ynhi Thi Le: Innovator in Thin Film Metrology
Introduction
Ynhi Thi Le is a prominent inventor based in Gresham, OR (US), known for her significant contributions to the field of thin film metrology. With a total of 4 patents to her name, she has developed innovative technologies that enhance the monitoring and measurement of thin films in various processing systems.
Latest Patents
One of her latest patents is an "In-situ metrology system and method for monitoring metalization and other thin film formation." This invention provides a non-destructive metrology system that measures the composition, quality, and thickness of thin films formed on substrates during processing. The system utilizes a spectroscopic ellipsometer that operates while the wafer is in the processing system, allowing for real-time data collection. Another notable patent is for the "Fabrication of trenches with multiple depths on the same substrate." This technology enables the simultaneous etching of shallow and deep trenches on a single wafer, improving efficiency in semiconductor manufacturing.
Career Highlights
Ynhi has worked with notable companies such as LSI Logic Corporation and LSI Corporation, where she applied her expertise in thin film technologies. Her work has significantly impacted the semiconductor industry, particularly in enhancing the precision of thin film measurements.
Collaborations
Throughout her career, Ynhi has collaborated with esteemed colleagues, including Mohammad R Mirbedini and Venkatesh P Gopinath. These collaborations have furthered her research and development efforts in the field of metrology.
Conclusion
Ynhi Thi Le's innovative work in thin film metrology has established her as a key figure in the industry. Her patents reflect her commitment to advancing technology and improving manufacturing processes.