Yixiong Zheng

Title: Inventor Spotlight: Yixiong Zheng from Amherst, NY

Introduction

Yixiong Zheng is a talented inventor based in Amherst, NY. He holds one patent that showcases his innovative approach in the field of material science and engineering.

Latest Patents

Yixiong Zheng's noteworthy patent is titled "Deep etching substrates using a bi-layer etch mask." This patent outlines a method that involves providing a carbonaceous material on a substrate with a first thermal conductivity. The method further details depositing a first masking layer with a second thermal conductivity ratio, where the ratio of the second thermal conductivity to the first is less than or equal to 1:30. This patent exemplifies his expertise in etching processes, providing significant advancements in the field.

Career Highlights

Throughout his career, Yixiong Zheng has contributed to various organizations, including Fraunhofer USA, Inc. and the State University of New York. His diverse experiences have allowed him to refine his skills and apply his knowledge within esteemed institutions.

Collaborations

Yixiong has had the privilege of working alongside notable colleagues such as Jung-Hun Seo and Matthias Muehle. These collaborations have undoubtedly influenced his work and contributed to his understanding of complex engineering challenges.

Conclusion

Yixiong Zheng's contributions to the field of material science, particularly through his patent for deep etching substrates, highlight his innovative spirit and dedication to advancing technology. His career and collaborations further underscore his significance as an inventor in the industry.