The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 30, 2024

Filed:

Jun. 24, 2021
Applicants:

Fraunhofer Usa, Inc., Plymouth, MI (US);

The Research Foundation for the State University of New York, Buffalo, NY (US);

Inventors:

Jung-Hun Seo, Buffalo, NY (US);

Yixiong Zheng, Amherst, NY (US);

Matthias Muehle, Howell, MI (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/04 (2006.01); G03F 7/36 (2006.01); C23C 14/06 (2006.01); C23C 14/58 (2006.01);
U.S. Cl.
CPC ...
G03F 7/36 (2013.01); C23C 14/04 (2013.01); C23C 14/06 (2013.01); C23C 14/5873 (2013.01); B81C 2201/0146 (2013.01);
Abstract

A method comprising providing a carbonaceous material, the substrate having a first thermal conductivity. The method further comprises depositing a first masking layer having a second thermal conductivity on at least a portion of the substrate, a ratio of the second thermal conductivity to the first thermal conductivity being less than or equal to 1:30. The method further comprises depositing a second masking layer on the first masking layer to form an etch mask, and etching an exposed portion of the substrate.


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