Jung-Hun Seo

Title: Jung-Hun Seo: Innovator in Deep Etching Technologies

Introduction

Jung-Hun Seo is a notable inventor based in Buffalo, NY (US). He has made significant contributions to the field of etching technologies, particularly through his innovative patent. His work has implications for various applications in materials science and engineering.

Latest Patents

Jung-Hun Seo holds a patent for a method titled "Deep etching substrates using a bi-layer etch mask." This method involves providing a carbonaceous material on a substrate with a specific thermal conductivity. The process includes depositing a first masking layer with a lower thermal conductivity ratio and a second masking layer to form an etch mask, ultimately allowing for precise etching of the substrate. He has 1 patent to his name.

Career Highlights

Throughout his career, Jung-Hun Seo has worked with prominent organizations such as Fraunhofer USA, Inc. and the State University of New York. His experience in these institutions has allowed him to develop and refine his innovative techniques in etching.

Collaborations

Jung-Hun Seo has collaborated with talented individuals in his field, including Yixiong Zheng and Matthias Muehle. These partnerships have contributed to the advancement of his research and the successful implementation of his patented technologies.

Conclusion

Jung-Hun Seo is a distinguished inventor whose work in deep etching technologies has paved the way for advancements in materials science. His contributions are valuable to both academic and industrial applications.