Xiamen, China

Yiwen Luo

This inventor holds 1 USPTO granted patent. Top assignee: Tianma Advanced Display Technology Institute (Xiamen) Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yiwen Luo. Retrieved from https://idiyas.com/inventor/yiwen-luo-8ng99x4v

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Yiwen Luo - Innovator in Display Technology

Introduction

Yiwen Luo is a notable inventor based in Xiamen, China. He has made significant contributions to the field of display technology. His innovative work focuses on enhancing the performance and quality of display panels.

Latest Patents

Yiwen Luo holds a patent for a "Color shift compensation method of display panel and display device." This invention addresses the challenges of color shift in display panels. The method involves acquiring initial display parameters and ambient temperature, determining the actual temperature of the display panel, and creating a compensation gamma table. This process allows for the provision of compensation data signals to the display pixels, ensuring optimal color accuracy.

Career Highlights

Yiwen Luo is associated with Tianma Advanced Display Technology Institute (Xiamen) Co., Ltd. His work at this institute has been pivotal in advancing display technologies. He has a proven track record of innovation, with a focus on improving user experience through enhanced display quality.

Collaborations

Yiwen collaborates with talented individuals such as Yiting Liu and Peixuan Chen. Their teamwork fosters a creative environment that drives innovation in display technology.

Conclusion

Yiwen Luo's contributions to display technology exemplify the impact of innovative thinking in enhancing everyday devices. His patent on color shift compensation showcases his commitment to improving display performance.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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