Nanjing, China

Yisheng Wang

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Cccc Tunnel Engineering Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yisheng Wang. Retrieved from https://idiyas.com/inventor/yisheng-wang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 11.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Yisheng Wang: Innovator in Underground Shield Docking Technology

Introduction

Yisheng Wang is a prominent inventor based in Nanjing, China. He has made significant contributions to the field of engineering, particularly in the development of innovative testing platforms for underground shield docking.

Latest Patents

Wang holds a patent for a "Large-scale underground shield docking model test platform and test method using same." This invention features a comprehensive test platform that includes a test soil tank, a partition wall, a shield docking model, and a freezing system. The design allows for effective testing of shield docking models in a controlled environment, enhancing the understanding of underground construction processes.

Career Highlights

Yisheng Wang is associated with CCCC Tunnel Engineering Co., Ltd., where he applies his expertise in tunnel engineering and underground construction. His work has been instrumental in advancing the methodologies used in this specialized field.

Collaborations

Wang collaborates with notable colleagues such as Zhanhu Yao and Yazhou Zhang, contributing to various projects that aim to improve underground construction techniques.

Conclusion

Yisheng Wang's innovative work in underground shield docking technology exemplifies the importance of engineering advancements in modern construction. His contributions continue to influence the industry and pave the way for future developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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