Yiren Wu

Title: Yiren Wu - Innovator in Semiconductor Metrology

Introduction

Yiren Wu is a prominent inventor based in Chandler, AZ (US). He has made significant contributions to the field of semiconductor metrology, showcasing his expertise through innovative patent developments. His work focuses on enhancing measurement techniques that are crucial for semiconductor manufacturing.

Latest Patents

Yiren Wu holds a patent for a system titled "Non-destructive gap metrology." This patent describes a metrology system equipped with 3-dimensional sensors designed for thickness measurements of semiconductor elements. The system employs a single or dual 3-dimensional profiler that scans both the top and bottom surfaces of an element to obtain accurate thickness measurements. Additionally, the method can be utilized to measure gaps between elements that have been assembled together, demonstrating its versatility and importance in the semiconductor industry.

Career Highlights

Yiren Wu is currently employed at Intel Corporation, a leading technology company known for its advancements in semiconductor technology. His role at Intel allows him to work on cutting-edge projects that push the boundaries of what is possible in semiconductor manufacturing.

Collaborations

Some of Yiren Wu's notable coworkers include Jianyong Mo and V Wade Singleton. Their collaboration contributes to the innovative environment at Intel Corporation, fostering advancements in semiconductor technologies.

Conclusion

Yiren Wu's contributions to semiconductor metrology through his innovative patent and work at Intel Corporation highlight his role as a key figure in the industry. His advancements in measurement techniques are essential for the ongoing development of semiconductor technologies.