Company Filing History:
Years Active: 2021-2023
Title: Yiran Jiang: Innovator in Quantum Dot Technology
Introduction
Yiran Jiang is a prominent inventor based in Fremont, CA (US). He has made significant contributions to the field of quantum dot technology, holding 2 patents that showcase his innovative methods and techniques.
Latest Patents
One of Yiran Jiang's latest patents is focused on the photoresist contact patterning of quantum dot films. This patent describes a method for creating a patterned quantum dot layer. The process involves bringing a patterning stamp into contact with a layer of quantum dots on a substrate. The stamp consists of a patterned photoresist layer on an elastomer layer. A portion of the quantum dots in contact with the patterned photoresist adheres to the stamp. The method also includes peeling the stamp from the substrate at a speed greater than a predetermined peeling speed to remove the adhered quantum dots. This results in a remaining portion of the quantum dots forming a patterned quantum dot layer on the substrate.
Career Highlights
Yiran Jiang is affiliated with the University of Illinois, where he continues to advance his research and development in quantum dot technology. His work has garnered attention for its potential applications in various fields, including electronics and photonics.
Collaborations
Yiran has collaborated with notable colleagues such as Seok Kim and Moonsub Shim, contributing to a dynamic research environment that fosters innovation and discovery.
Conclusion
Yiran Jiang's contributions to quantum dot technology through his patents and research at the University of Illinois highlight his role as a leading inventor in this cutting-edge field. His innovative methods are paving the way for future advancements in technology.