Ying Yin Wang

Title: Innovations by Ying Yin Wang in Sputtering Techniques

Introduction

Ying Yin Wang, located in Hsiu-Chu, Taiwan, is a notable inventor recognized for his contributions to the field of semiconductor manufacturing. With one patent to his name, he has made significant advancements in the method of improving conformity and contact bottom coverage during sputtering processes.

Latest Patents

Wang's patent focuses on overcoming the challenges associated with non-conformity and poor step coverage when depositing materials, such as metals and barrier layers, into contact openings using physical-vapor-deposition (PVD) techniques. Conventional methods lead to a diminishing thickness towards the base of openings, causing potential failures when these openings are filled with chemical-vapor-deposited (CVD) tungsten. Wang's innovative method employs a two-stage reactive ion etching technique, allowing selective etching of the upper portion of the deposited layer, while protecting the lower portion with photoresist. This technique enables the restoration of material at the top of the opening while enhancing thickness at the base, effectively reducing negative taper and facilitating total filling by subsequent CVD deposition.

Career Highlights

Ying Yin Wang is currently associated with Taiwan Semiconductor Manufacturing Company Limited, where he applies his expertise in semiconductor technology. His inventive approach has positioned him as a key player in enhancing PVD techniques and addressing common challenges encountered in semiconductor fabrication.

Collaborations

Wang has collaborated with notable coworkers such as Chia Shiung Tsai and Chen-Hua Douglas Yu. Together, they contribute to the ongoing advancements in semiconductor technology, leveraging their collective expertise to push the boundaries of innovation in the industry.

Conclusion

Ying Yin Wang's innovations represent a crucial step forward in improving the effectiveness of sputtering techniques in semiconductor manufacturing. His patented method not only addresses existing problems but also paves the way for future developments in the field, making him an influential inventor within the industry.