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Years Active: 2006
Title: Innovations by Ying-Hui Lai: Pioneering Noble Metal Organometallic Complexes
Introduction
Ying-Hui Lai, an innovative inventor based in Nantou, Taiwan, has made significant contributions in the field of organometallic chemistry. His most notable achievement is the development of a unique series of noble metal organometallic complexes, which possess properties that enhance their volatility and thermal stability, making them ideal for various applications in chemical vapor deposition (CVD).
Latest Patents
Lai holds a patent for "Volatile noble metal organometallic complexes." This inventive work introduces a series of complexes characterized by the general formula (I): MLX(FBC), where M represents noble metals such as iridium, ruthenium, or osmium. The formula details various components, including neutral ligands like carbonyl, alkene, or diene; anionic ligands such as chloride, bromide, iodide, and trifluoroacetate; and fluorinated bidentate chelate ligands. The resulting complexes exhibit enhanced properties that make them suitable for CVD applications, particularly for the deposition of noble metal films and metal oxides.
Career Highlights
Ying-Hui Lai has worked at esteemed institutions, including the National Research Council of Canada and National Tsing Hua University. Throughout his career, he has focused on innovative research that bridges theoretical chemistry and practical applications, significantly impacting the field of material science.
Collaborations
In his pursuit of innovation, Lai has collaborated with fellow researchers such as Yun Chi and Yao-Lun Chen. These collaborations have propelled the development of advanced materials through shared expertise and joint investigation in organometallic chemistry.
Conclusion
Ying-Hui Lai continues to be an influential figure in the field of chemistry, particularly through his inventive works that contribute to the advancement of noble metal applications. His patent on organometallic complexes underscores his commitment to innovation, providing fertile ground for future research and technological advancements in chemical processes.
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