Company Filing History:
Years Active: 2019
Title: Ying-Hsien Chen: Innovator in Semiconductor Technology
Introduction
Ying-Hsien Chen is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods in device fabrication. His work has been recognized for its impact on the efficiency and effectiveness of semiconductor devices.
Latest Patents
Ying-Hsien Chen holds a patent titled "Method for fabricating metal replacement gate semiconductor device using dummy gate and composite spacer structure." This patent describes a method for fabricating a semiconductor device that involves several intricate steps. After forming a SiGe epitaxial layer within the Core_p region, the hard mask is removed. A contact etch stop layer (CESL) is then deposited on the composite spacer structure and the epitaxial layer. Following this, an ILD layer is deposited on the CESL and polished to expose the top surface of the dummy gate. The dummy gate and a first portion of the first nitride-containing layer of the composite spacer structure are removed, forming a gate trench and exposing the first gate dielectric layer. The first gate dielectric layer is subsequently removed from the gate trench, while a second portion of the first nitride-containing layer and the oxide layer are removed from the composite spacer structure, leaving the second nitride-containing layer intact.
Career Highlights
Ying-Hsien Chen is associated with United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to develop and refine his innovative techniques in semiconductor fabrication. His contributions have been instrumental in advancing the technology used in modern electronic devices.
Collaborations
Ying-Hsien Chen has collaborated with notable colleagues, including Chun-Chia Chen and Yao-Jhan Wang. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas within the semiconductor field.
Conclusion
Ying-Hsien Chen is a key figure in semiconductor innovation, with a focus on improving fabrication methods. His patent and work at United Microelectronics Corporation highlight his commitment to advancing technology in this critical industry. His contributions continue to shape the future of semiconductor devices.