Ying-Fa Huang

Title: Innovations of Ying-Fa Huang

Introduction

Ying-Fa Huang is a notable inventor based in Kaohsiung, Japan. He has made significant contributions to the field of active device array substrates, showcasing his expertise through his innovative patent.

Latest Patents

Huang holds a patent for an "Active device array substrate and method for fabricating the same." This invention involves a first patterned conductive layer that includes separated scan line patterns formed on a substrate. Each scan line pattern consists of a first and second scan line that are adjacent to each other, with both lines having corresponding contacts. The patent details a method for fabricating these layers, including the formation of channel layers and a second patterned conductive layer that interlaces data lines with the scan lines. This innovative design allows for pixel electrodes to be electrically connected to the drains, enhancing the functionality of the substrate.

Career Highlights

Huang is associated with Au Optronics Corporation, where he has been instrumental in advancing technologies related to display panels. His work has contributed to the development of more efficient and effective display technologies.

Collaborations

Huang has collaborated with notable colleagues such as Po-Lin Lai and Chun-Ming Yang, further enriching his contributions to the field.

Conclusion

Ying-Fa Huang's innovative work in the realm of active device array substrates exemplifies his commitment to advancing technology. His patent and collaborations highlight his significant role in the industry.