Taoyuan, Taiwan

Ying-Chieh Chen

This inventor holds 1 USPTO granted patent. Top assignee: Skiileux Electricity Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ying-Chieh Chen. Retrieved from https://idiyas.com/inventor/ying-chieh-chen-cedhvy0c

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Innovations of Ying-Chieh Chen

Introduction

Ying-Chieh Chen is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of film pattern technology. His innovative approach has led to the development of a unique method for forming film patterns, which has practical applications in various industries.

Latest Patents

Ying-Chieh Chen holds a patent for a method titled "Film pattern and methods for forming the same." This patent describes a process that involves providing a substrate with a surface for film pattern formation. The method includes using a pattern material containing hot-melt glue and a mask with light-transmitting and light-non-transmitting portions. The innovative aspect of this method lies in the use of a light source to generate heat, allowing the pattern material to adhere to the substrate effectively. This patent showcases his inventive capabilities and his contribution to advancing technology in this area. He has 1 patent to his name.

Career Highlights

Ying-Chieh Chen is associated with Skiileux Electricity Inc., where he applies his expertise in developing innovative solutions. His work at the company reflects his commitment to advancing technology and improving processes in the electrical industry. His career is marked by a focus on practical applications of his inventions.

Conclusion

Ying-Chieh Chen's contributions to film pattern technology demonstrate his innovative spirit and dedication to advancing the field. His patent reflects a significant step forward in the methods used for film pattern formation. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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