Taichung, Taiwan

Ying-Chia Chen


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: **Innovative Contributions of Ying-Chia Chen in Thin Film Transistor Technology**

Introduction

Ying-Chia Chen, an inventor based in Taichung, Taiwan, has made significant strides in the field of thin film transistors (TFTs). With one patent to his name, he has contributed to advancements that enhance the performance and efficiency of electronic devices. His innovative approach combines chemical processes to improve the crystallization of amorphous silicon, leading to better electronic characteristics.

Latest Patents

Ying-Chia Chen's notable patent is a "Method for forming thin film transistor," which introduces a unique technique using metal electroless plating or chemical displacement processes. This invention focuses on the formation of metal clusters adjacent to the sidewall of an amorphous silicon active region pattern, facilitating the crystallization of amorphous silicon through a metal-induced lateral crystallization process. The resulting polysilicon features parallel grains, which significantly enhance electron mobility.

Career Highlights

Chen is affiliated with the Industrial Technology Research Institute, a prestigious organization dedicated to technological advancements in Taiwan. His work in developing methodologies for enhancing thin film transistors has positioned him as a valuable contributor in the realm of electronics and semiconductor research.

Collaborations

During his career, Ying-Chia Chen has collaborated with adept professionals, including coworkers Guo-Ren Hu and Chi-Wei Chao. Their collective expertise has amalgamated to foster innovative solutions within their research initiatives, further pushing the boundaries of technology in the electronic field.

Conclusion

Ying-Chia Chen's contributions to the development of thin film transistors demonstrate the impact that innovative methodologies can have in the electronics industry. By leveraging advanced techniques to improve the properties of amorphous silicon, he continues to play a vital role in shaping the future of electronic devices. His work not only underscores the importance of patenting innovations but also highlights the collaborative efforts essential for technological progression.

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