This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Applied Materials, Inc.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Ying-Bing Jiang: Innovator in Metal Deposition Technologies
Introduction
Ying-Bing Jiang is a notable inventor based in San Jose, CA. He has made significant contributions to the field of chemical vapor deposition (CVD) technologies. His innovative methods focus on enhancing the efficiency of metal deposition processes.
Latest Patents
Ying-Bing Jiang holds a patent for a method of selective metal deposition using separated reactant activation and plasma discharging zones. This patent outlines a process for depositing a metal silicide on a substrate with a silicon-containing surface. The method involves creating a plasma in a CVD chamber, flowing gases through independent openings, and activating the metal precursor gas before exposing it to the substrate.
Career Highlights
Ying-Bing Jiang is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has allowed him to develop and refine advanced deposition techniques that are crucial for modern manufacturing processes.
Collaborations
Ying-Bing Jiang has collaborated with notable colleagues, including Avgerinos V Gelatos and Gary How. These partnerships have contributed to the advancement of technologies in the field of semiconductor manufacturing.
Conclusion
Ying-Bing Jiang's innovative work in metal deposition technologies exemplifies the importance of advancements in the semiconductor industry. His contributions continue to influence the development of efficient manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile