Yinfeng Dong

Title: Yinfeng Dong: Innovator in Digital Lithography

Introduction

Yinfeng Dong is a notable inventor based in San Jose, California. He has made significant contributions to the field of digital lithography, holding two patents that enhance the efficiency and accuracy of digital pattern generation and verification.

Latest Patents

Yinfeng Dong's latest patents include the "Optimization of a digital pattern file for a digital lithography device." This invention involves a digital pattern generation system that utilizes a memory and a controller to remove redundant cells from a digital pattern file. The controller generates an updated digital pattern file and compares it with the original file. It further reduces the number of vertexes of a first arc to create a second updated digital pattern file. Additionally, the first cell of this file can be replaced with an alternative version, leading to a third updated digital pattern file. The final step involves converting polygons within this file to quad polygons, resulting in an optimized digital pattern file.

Another significant patent is "Preserving hierarchical structure information within a design file." This verification device is designed to verify a design file for digital lithography. It comprises a memory that holds the design file and a controller that applies compliance rules to determine the file's adherence to standards. The rules include detecting non-orthogonal edges, overlapping structures, and interactions between reference and target layers. The controller verifies the design file based on these compliance checks.

Career Highlights

Yinfeng Dong is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work focuses on advancing technologies that improve digital lithography processes.

Collaborations

Yinfeng has collaborated with notable coworkers, including Chung-Shin Kang and Tsaichuan Kao, contributing to innovative projects within his field.

Conclusion

Yinfeng Dong's contributions to digital lithography through his patents and work at Applied Materials, Inc. highlight his role as a key innovator in the industry. His inventions are paving the way for more efficient and accurate digital pattern generation and verification processes.