Dalian, China

Yiming Li

This inventor holds 2 USPTO granted patents. Top assignee: Fmr Corp.. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yiming Li. Retrieved from https://idiyas.com/inventor/yiming-li-8ck9484l

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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2 patents (USPTO):Explore Patents

Title: Yiming Li - Innovator in Extended Reality Technologies

Introduction

Yiming Li is a prominent inventor based in Dalian, China. He has made significant contributions to the field of extended reality (XR) technologies. With a total of 2 patents, his work focuses on enhancing user experiences in virtual environments.

Latest Patents

Yiming Li's latest patents include a dual screen extended reality headset device. This innovative headset features a first display screen for the wearer and a second display screen for external viewers. The device generates a virtual environment for the wearer while capturing data related to the software application and the user's interactions. Another notable patent involves automated testing of virtual reality software applications using robotic devices. This system allows for efficient testing by converting test workflows into actionable sequences for robotic execution.

Career Highlights

Yiming Li is currently employed at FMR Corporation, where he continues to develop cutting-edge technologies. His work has positioned him as a key player in the XR industry, contributing to advancements that improve both user engagement and software reliability.

Collaborations

Yiming collaborates with talented individuals such as Hangyu Wang and Yibo He. Together, they work on innovative projects that push the boundaries of technology in the virtual reality space.

Conclusion

Yiming Li's contributions to extended reality technologies demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of user needs and technological possibilities.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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