Company Filing History:
Years Active: 2003-2004
Title: Yih-Shi Lin: Innovator in Semiconductor Processing
Introduction
Yih-Shi Lin is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor processing, particularly in the area of chemical mechanical polishing. With a total of 2 patents, Lin's work has advanced the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
Lin's latest patents include a "Method for controlling and monitoring a chemical mechanical polishing process." This invention relates to a method of controlling and monitoring the thickness variation of the film structure of a semiconductor wafer. The method is characterized by etching the film structure of a testing region with a pattern density substantially compatible with that of the device region. This approach allows for precise simulation of the thickness variation of the film structure during the chemical mechanical polishing process.
Another notable patent is the "Method and circuit layout for reducing post chemical mechanical polishing defect count." This invention provides a method and circuit layout on a substrate of a semiconductor wafer, aimed at reducing defects during the chemical mechanical polishing process. The circuit layout comprises a plurality of strips of first circuit structure and at least two strips of second circuit structure. Each strip of the second circuit structure links the front end and rear end of the first circuit structure, averaging polishing pressure to minimize defects.
Career Highlights
Yih-Shi Lin is currently employed at Macronix International Co., Ltd., where he continues to innovate in semiconductor technology. His work has been instrumental in enhancing the quality and reliability of semiconductor devices.
Collaborations
Lin has collaborated with notable colleagues such as Chun-Lien Su and Chi-Yuan Chin, contributing to advancements in their shared field of expertise.
Conclusion
Yih-Shi Lin's contributions to semiconductor processing through his innovative patents demonstrate his commitment to improving manufacturing techniques. His work not only enhances the efficiency of the chemical mechanical polishing process but also sets a standard for future innovations in the industry.