This inventor holds 1 USPTO granted patent. Top assignees: Boe Technology Group Co., Ltd., Hefei Boe Optoelectronics Technology Co., Ltd.. Active years: 2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 18,296 
1 out of 815 
Years Active: 2017
Title: Yifeng Li: Inventor in Exposure Pattern Correction
Introduction
Yifeng Li is an inventor based in Beijing, China. His work includes a patented method and apparatus for correcting exposure patterns, as well as an exposure system.
Latest Patents
Li is associated with 1 patent: “Method and Apparatus for Exposure Pattern Correction and Exposure System.” The invention describes adjusting a substrate-supporting worktable to correct an exposure pattern. It determines displacement adjustments in two perpendicular horizontal directions, a rotation adjustment around the base table’s central axis, and a gap adjustment between the worktable and mask plate. The worktable is then moved according to those parameters.
Career Highlights
Li has been associated with Hefei BOE Optoelectronics Technology Co., Ltd. and BOE Technology Group Co., Ltd. His patent focuses on coordinating worktable position, rotation, and spacing to support exposure-pattern correction.
Collaborations
Li’s listed coworkers include Hequn Zhang and Xiangming Meng.
Conclusion
Yifeng Li’s patent addresses exposure-pattern correction through coordinated adjustments to a worktable’s position, rotation, and gap, reflecting his work in exposure-system technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile