Shanghai, China

Yidong Ji

USPTO Granted Patents = 1 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Yidong Ji in Shanghai

Introduction

Yidong Ji, an inventive mind located in Shanghai, China, has made notable strides in the field of technology with his innovative patent. With a single patent to his name, he has demonstrated his ability to develop solutions that address complex challenges in high-performance display technology.

Latest Patents

Yidong Ji's patent focuses on a test card and a test display adapter designed to improve preliminary heat dissipation tests of high-performance display adapters. This innovative design includes an assembling plate and an electrical heat source composed of a first and second heat transfer plate, along with at least one heat source element. These components work together to create an efficient testing mechanism that boasts advantages such as low cost, easy material availability, minimal wait time, manufacturability, extended service life, modifiability, and good interoperability.

Career Highlights

Throughout his career, Yidong Ji has contributed to various technological advancements while working with notable companies such as Inventec (Pudong) Technology Corporation and Inventec Corporation. His role in these organizations reflects his dedication to innovation and his commitment to enhancing technological processes.

Collaborations

In his journey, Yidong Ji has collaborated with talented professionals such as Xuefeng Chen and Pinyi Xiang. These partnerships have likely fostered a creative environment that encourages the exchange of ideas and promotes groundbreaking discoveries.

Conclusion

Yidong Ji's contributions to the world of technology through his patent represent a meaningful advancement in display adapter testing processes. His commitment to innovation and collaboration highlights the ongoing evolution within the field, showcasing the potential for further developments that can enhance efficiency and effectiveness in technology.

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