Yichen Liang

Title: Yichen Liang: Innovator in EUV Lithography

Introduction

Yichen Liang, based in Rolla, MO, is an accomplished inventor known for his contributions to the field of microelectronics. With a total of two patents to his name, he is at the forefront of innovations in lithographic processes utilized in advanced manufacturing.

Latest Patents

Liang's latest patents focus on enhancing the efficiency and effectiveness of extreme ultraviolet (EUV) lithography. His first patent involves the development of adhesion layers for EUV lithography. This invention introduces new lithographic compositions designed to be used as EUV adhesion layers, offering methods for fabricating microelectronic structures. The approach utilizes an adhesion layer positioned directly beneath the photoresist layer, which can be applied to substrates or any intermediate layers, including alpha-carbon and metal hardmasks. The use of spin-coatable, polymeric compositions as adhesion layers significantly improves adhesion and minimizes issues related to pattern collapse.

The second patent concerns underlayers for EUV lithography. This invention also presents new lithographic compositions intended for use as silicon hardmask layers in EUV processes. The method incorporates a silicon hardmask layer immediately below the photoresist layer, allowing for flexibility in application to either substrates or intermediate layers. Similarly, these silicon hardmask layers are formed from spin-coatable, polymeric compositions, which have been demonstrated to enhance adhesion and mitigate pattern collapse challenges.

Career Highlights

Yichen Liang is a notable figure at Brewer Science, Inc., a company dedicated to providing innovative solutions in the microelectronics industry. His work in advancing EUV lithography showcases his commitment to pushing the boundaries of technological applications in electronic manufacturing.

Collaborations

Throughout his career, Liang has collaborated with talented colleagues, including Andrea M. Chacko and Yubao Wang. Together, they contribute to the ongoing progress in microelectronics, leveraging their combined expertise to explore new possibilities in lithographic technologies.

Conclusion

Yichen Liang's contributions to EUV lithography reflect his innovation-driven approach and commitment to excellence in the field. With his cutting-edge patents, he continues to play a pivotal role in enhancing the capabilities of microelectronic manufacturing processes.